Chang-Yeh Lee started his PhD research from 2014 at the University of New South Wales focusing on low recombination contacts for hydrogen passivated silicon solar cells. He received a Master of Physics from National Tsing Hua University and National Synchrotron Radiation Research Center in 2009, and he completed the coursework based postgraduate program at the University of New South Wales in 2013. His research interests include high-efficient solar cell and passivation design in commercial solar cells.
The first part of his research focus is the interface engineering of atomic layer deposition (ALD) of Al2O3 on c-Si using dimethylaluminum isopropoxide (DMAI) as a non-pyrophoric Al precursor. Surface pre-treatments on the c-Si surface were found to improve the performance of Al2O3 when using water as the oxidant. The interface property can be detected by Fourier-transform infrared spectroscopy (FTIR) with a polariser and an angular holder. The second focus is to evaluate the thermal stability of ALD WOx/a-Si:H stack. The plasma damage which caused during the ALD process could be recovered by a post-annealing process. Further optimisation of the ALD process is ongoing towards hole-selective-contact. He also has experience on evaporated CZTS absorber and the fabrication of a-Si:H and poly-Si layers.